Abstract
The effect of film morphology on the photovoltaic performances is illustrated. Pin holes free and uniform films could be formed by slowing down the crystallization rate through additional of excess CH3NH3+. Though better film coverage is obtained, the device series resistance increases as excess CH3NH3I increases. Thermogravimetric analysis confirms the presence of residual excess CH3NH3I in the final film. When chlorine is added to the CH3NH3+ rich system, CH3NH3Cl is formed and can easily sublime during annealing at 100 °C. A little trace of excess CH3NH3Cl can be detected from thermogravic analysis, and the residual chlorine atoms match with XPS reading.
Original language | English |
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Pages (from-to) | 2309-2314 |
Number of pages | 6 |
Journal | Chemistry of Materials |
Volume | 27 |
Issue number | 7 |
DOIs | |
Publication status | Published - Apr 14 2015 |
Externally published | Yes |
Bibliographical note
Publisher Copyright:© 2015 American Chemical Society.
ASJC Scopus Subject Areas
- General Chemistry
- General Chemical Engineering
- Materials Chemistry