UV Embossing of Sub-micrometer Patterns on Biocompatible Polymeric Films Using a Focused Ion Beam Fabricated TiN Mold

J. X. Gao; M. B. Chan-Park; D. Z. Xie; Y. H. Yan; W. X. Zhou; B. K.A. Ngoi; C. Y. Yue

doi:10.1021/cm0342849

UV Embossing of Sub-micrometer Patterns on Biocompatible Polymeric Films Using a Focused Ion Beam Fabricated TiN Mold

J. X. Gao, M. B. Chan-Park^*, D. Z. Xie, Y. H. Yan, W. X. Zhou, B. K.A. Ngoi, C. Y. Yue

^*Corresponding author for this work

Nanyang Technological University

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

UV embossing combined with focused ion beam lithography (FIB) and soft lithography is demonstrated to be a viable method for quick and accessible three-dimensional large-area submicrometer patterning of biocompatible films. FIB lithography of titanium nitride thin film is also demonstrated to produce a very smooth surface suitable for nanopatterning.

Original language	English
Pages (from-to)	956-958
Number of pages	3
Journal	Chemistry of Materials
Volume	16
Issue number	6
DOIs	https://doi.org/10.1021/cm0342849
Publication status	Published - Mar 23 2004
Externally published	Yes

ASJC Scopus Subject Areas

General Chemistry
General Chemical Engineering
Materials Chemistry

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10.1021/cm0342849

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abstract = "UV embossing combined with focused ion beam lithography (FIB) and soft lithography is demonstrated to be a viable method for quick and accessible three-dimensional large-area submicrometer patterning of biocompatible films. FIB lithography of titanium nitride thin film is also demonstrated to produce a very smooth surface suitable for nanopatterning.",

author = "Gao, {J. X.} and Chan-Park, {M. B.} and Xie, {D. Z.} and Yan, {Y. H.} and Zhou, {W. X.} and Ngoi, {B. K.A.} and Yue, {C. Y.}",

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AU - Gao, J. X.

AU - Chan-Park, M. B.

AU - Xie, D. Z.

AU - Yan, Y. H.

AU - Zhou, W. X.

AU - Ngoi, B. K.A.

AU - Yue, C. Y.

PY - 2004/3/23

Y1 - 2004/3/23

N2 - UV embossing combined with focused ion beam lithography (FIB) and soft lithography is demonstrated to be a viable method for quick and accessible three-dimensional large-area submicrometer patterning of biocompatible films. FIB lithography of titanium nitride thin film is also demonstrated to produce a very smooth surface suitable for nanopatterning.

AB - UV embossing combined with focused ion beam lithography (FIB) and soft lithography is demonstrated to be a viable method for quick and accessible three-dimensional large-area submicrometer patterning of biocompatible films. FIB lithography of titanium nitride thin film is also demonstrated to produce a very smooth surface suitable for nanopatterning.

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UV Embossing of Sub-micrometer Patterns on Biocompatible Polymeric Films Using a Focused Ion Beam Fabricated TiN Mold

Abstract

ASJC Scopus Subject Areas

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