Van der Waals engineering for quantum-entangled photon generation

Leevi Kallioniemi; Xiaodan Lyu; Ruihua He; Abdullah Rasmita; Ruihuan Duan; Zheng Liu; Weibo Gao

doi:10.1038/s41566-024-01545-5

Van der Waals engineering for quantum-entangled photon generation

Leevi Kallioniemi, Xiaodan Lyu, Ruihua He, Abdullah Rasmita, Ruihuan Duan, Zheng Liu, Weibo Gao^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Van der Waals engineering serves as a powerful tool to tailor material properties and design excitonic devices. Here we report quantum-entangled photon pair generation through van der Waals engineering with two-dimensional materials. We align two van der Waals thin layers perpendicular to each other, yielding polarization-entangled photon pairs through the interference of biphoton emission in the two flakes. The polarization-entangled state is measured with a fidelity up to 86 ± 0.7%. The compatibility of van der Waals engineering with on-chip photonics opens new possibilities for entangled photon source integration at the subwavelength scale.

Original language	English
Journal	Nature Photonics
DOIs	https://doi.org/10.1038/s41566-024-01545-5
Publication status	Accepted/In press - 2024
Externally published	Yes

Bibliographical note

Publisher Copyright:
© The Author(s), under exclusive licence to Springer Nature Limited 2024.

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics

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10.1038/s41566-024-01545-5

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title = "Van der Waals engineering for quantum-entangled photon generation",

abstract = "Van der Waals engineering serves as a powerful tool to tailor material properties and design excitonic devices. Here we report quantum-entangled photon pair generation through van der Waals engineering with two-dimensional materials. We align two van der Waals thin layers perpendicular to each other, yielding polarization-entangled photon pairs through the interference of biphoton emission in the two flakes. The polarization-entangled state is measured with a fidelity up to 86 ± 0.7%. The compatibility of van der Waals engineering with on-chip photonics opens new possibilities for entangled photon source integration at the subwavelength scale.",

author = "Leevi Kallioniemi and Xiaodan Lyu and Ruihua He and Abdullah Rasmita and Ruihuan Duan and Zheng Liu and Weibo Gao",

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AU - Kallioniemi, Leevi

AU - Lyu, Xiaodan

AU - He, Ruihua

AU - Rasmita, Abdullah

AU - Duan, Ruihuan

AU - Liu, Zheng

AU - Gao, Weibo

PY - 2024

Y1 - 2024

N2 - Van der Waals engineering serves as a powerful tool to tailor material properties and design excitonic devices. Here we report quantum-entangled photon pair generation through van der Waals engineering with two-dimensional materials. We align two van der Waals thin layers perpendicular to each other, yielding polarization-entangled photon pairs through the interference of biphoton emission in the two flakes. The polarization-entangled state is measured with a fidelity up to 86 ± 0.7%. The compatibility of van der Waals engineering with on-chip photonics opens new possibilities for entangled photon source integration at the subwavelength scale.

AB - Van der Waals engineering serves as a powerful tool to tailor material properties and design excitonic devices. Here we report quantum-entangled photon pair generation through van der Waals engineering with two-dimensional materials. We align two van der Waals thin layers perpendicular to each other, yielding polarization-entangled photon pairs through the interference of biphoton emission in the two flakes. The polarization-entangled state is measured with a fidelity up to 86 ± 0.7%. The compatibility of van der Waals engineering with on-chip photonics opens new possibilities for entangled photon source integration at the subwavelength scale.

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Van der Waals engineering for quantum-entangled photon generation

Abstract

Bibliographical note

ASJC Scopus Subject Areas

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