Visualizing charge transport in silicon nanocrystals embedded in SiO 2 films with electrostatic force microscopy

C. Y. Ng; T. P. Chen; H. W. Lau; Y. Liu; M. S. Tse; O. K. Tan; V. S.W. Lim

doi:10.1063/1.1801675

Visualizing charge transport in silicon nanocrystals embedded in SiO ₂ films with electrostatic force microscopy

C. Y. Ng, T. P. Chen^*, H. W. Lau, Y. Liu, M. S. Tse, O. K. Tan, V. S.W. Lim

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

45 Citations (Scopus)

Abstract

The charge transport in silicon nanocrystals (nc-Si) embedded in SiO ₂ dielectric films was analyzed using electrostatic force microscopy (EFM). It was found that the charge diffusion from nc-Si was the dominant mechanism for the decay of trapped charge in the nc-Si. An increase in the charge cloud area due to the charge diffusion was also observed. The results show the blockage and acceleration of charge diffusion by the neighbouring charges with same and opposite charge signs.

Original language	English
Pages (from-to)	2941-2943
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	14
DOIs	https://doi.org/10.1063/1.1801675
Publication status	Published - Oct 4 2004
Externally published	Yes

ASJC Scopus Subject Areas

Physics and Astronomy (miscellaneous)

Access to Document

10.1063/1.1801675

Cite this

@article{6fb0d94f3c21425db5086572b8769474,

title = "Visualizing charge transport in silicon nanocrystals embedded in SiO 2 films with electrostatic force microscopy",

abstract = "The charge transport in silicon nanocrystals (nc-Si) embedded in SiO 2 dielectric films was analyzed using electrostatic force microscopy (EFM). It was found that the charge diffusion from nc-Si was the dominant mechanism for the decay of trapped charge in the nc-Si. An increase in the charge cloud area due to the charge diffusion was also observed. The results show the blockage and acceleration of charge diffusion by the neighbouring charges with same and opposite charge signs.",

author = "Ng, {C. Y.} and Chen, {T. P.} and Lau, {H. W.} and Y. Liu and Tse, {M. S.} and Tan, {O. K.} and Lim, {V. S.W.}",

year = "2004",

month = oct,

day = "4",

doi = "10.1063/1.1801675",

language = "English",

volume = "85",

pages = "2941--2943",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "14",

}

TY - JOUR

T1 - Visualizing charge transport in silicon nanocrystals embedded in SiO 2 films with electrostatic force microscopy

AU - Ng, C. Y.

AU - Chen, T. P.

AU - Lau, H. W.

AU - Liu, Y.

AU - Tse, M. S.

AU - Tan, O. K.

AU - Lim, V. S.W.

PY - 2004/10/4

Y1 - 2004/10/4

N2 - The charge transport in silicon nanocrystals (nc-Si) embedded in SiO 2 dielectric films was analyzed using electrostatic force microscopy (EFM). It was found that the charge diffusion from nc-Si was the dominant mechanism for the decay of trapped charge in the nc-Si. An increase in the charge cloud area due to the charge diffusion was also observed. The results show the blockage and acceleration of charge diffusion by the neighbouring charges with same and opposite charge signs.

AB - The charge transport in silicon nanocrystals (nc-Si) embedded in SiO 2 dielectric films was analyzed using electrostatic force microscopy (EFM). It was found that the charge diffusion from nc-Si was the dominant mechanism for the decay of trapped charge in the nc-Si. An increase in the charge cloud area due to the charge diffusion was also observed. The results show the blockage and acceleration of charge diffusion by the neighbouring charges with same and opposite charge signs.

UR - http://www.scopus.com/inward/record.url?scp=8344281429&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=8344281429&partnerID=8YFLogxK

U2 - 10.1063/1.1801675

DO - 10.1063/1.1801675

M3 - Article

AN - SCOPUS:8344281429

SN - 0003-6951

VL - 85

SP - 2941

EP - 2943

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 14

ER -

Visualizing charge transport in silicon nanocrystals embedded in SiO ₂ films with electrostatic force microscopy

Abstract

ASJC Scopus Subject Areas

Access to Document

Other files and links

Fingerprint

Cite this