X-ray residual stress measurement in films with crystallographic texture and grain shape

L. G. Yu*, B. C. Hendrix, K. W. Xu, J. W. He, H. C. Gu

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Citations (Scopus)

Abstract

X-ray diffraction provides an easy and powerful method for measuring residual stress in thin films. However, nonlinearity of the d vs. sin2ψ relation can lead to the misinterpretation of results, especially when one of the measurements is made at low values of ψ. It is shown that anisotropy from either crystallographic texture or grain shape will cause serious nonlinearity. Calculations of the d vs. sin2ψ relation for different combinations of ideal crystallographic textures and grain shapes are given. In all cases, a high ψ angle range exists where the d vs. sin2ψ relation is linear and the residual stress can be determined from easily calculated Reuss and Voigt model elastic constants. This is despite the fact that more complicated models are necessary to predict the d vs. sin2ψ relation in the low ψ angle range.

Original languageEnglish
Pages (from-to)177-182
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume403
Publication statusPublished - 1996
Externally publishedYes
EventProceedings of the 1995 MRS Fall Symposium - Boston, MA, USA
Duration: Nov 27 1995Dec 1 1995

ASJC Scopus Subject Areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint

Dive into the research topics of 'X-ray residual stress measurement in films with crystallographic texture and grain shape'. Together they form a unique fingerprint.

Cite this