A Base-Stabilized Silylene-Promoted C(sp3)-H Borylation and H2Activation

Sabrina Khoo, Chi Kit Siu*, Cheuk Wai So*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

Treatment of the amidinato amidosilylene [L{(Me3Si)2N}Si:] [1, L = PhC(NtBu)2] with a slight excess of borane-tetrahydrofuran complex [BH3·THF] in toluene at room temperature afforded the silylene-borane adduct [L{(Me3Si)2N}Si:→BH3] (2). A triflate substituent was introduced on the boron center by reacting 2 with methyl triflate [MeOTf] (OTf = OSO2CF3) in toluene at room temperature to form [L{(Me3Si)2N}Si:→BH2OTf] (3), with the elimination of CH4 gas. The intramolecular C(sp3)-H borylation and H2 elimination occurred by reacting complex 3 with 1 in refluxing toluene to form a C-B bond in the resulting silylene-boronium ion 5. Complex 5 activated H2 gas or NH3BH3 at room temperature to form silylene-borane adduct 2 and [L{(Me3Si)2N}Si-H]OTf. Additionally, the reaction of 5 with H2 was studied through density functional theory calculations.

Original languageEnglish
Pages (from-to)9551-9559
Number of pages9
JournalInorganic Chemistry
Volume59
Issue number14
DOIs
Publication statusPublished - Jul 20 2020
Externally publishedYes

Bibliographical note

Publisher Copyright:
Copyright © 2020 American Chemical Society.

ASJC Scopus Subject Areas

  • Physical and Theoretical Chemistry
  • Inorganic Chemistry

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